Conjunto de dados para caracterização de Siliceto de Níquel-Platina para uso em tecnologia CMOS

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Cioldin, Frederico Hummel; Diniz, José Alexandre; César, Rodrigo Reigota, 2026, "Conjunto de dados para caracterização de Siliceto de Níquel-Platina para uso em tecnologia CMOS", https://doi.org/10.25824/redu/NU3C6R, Repositório de Dados de Pesquisa da Unicamp, V1, UNF:6:CRn3/Ayb3Zh+AaI9ANrBzw== [fileUNF]
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Description
Este conjunto de dados reúne informações primárias obtidas a partir da fabricação e caracterização de filmes finos de siliceto de níquel-platina (NiPtSi) depositados sobre substratos de silício, no contexto de processos de micro e nanofabricação. Os dados abrangem diferentes condições experimentais, incluindo variações de espessura, composição, tratamentos térmicos e parâmetros de processo, organizadas em grupos experimentais sistemáticos. As informações contemplam resultados de múltiplas técnicas de caracterização, como difração de raios X (XRD/GIXRD) para análise estrutural e identificação de fases, microscopia de força atômica (AFM) para avaliação morfológica e de rugosidade, microscopia eletrônica de varredura (SEM) para análise superficial, espectroscopia Raman para investigação de fases e tensões, além de medições elétricas (resistividade por quatro pontas). O conjunto foi estruturado para permitir a correlação entre parâmetros de processamento e propriedades estruturais, morfológicas e elétricas dos filmes, possibilitando análises comparativas, identificação de tendências de formação de fases e avaliação de desempenho dos silicetos formados. Esses dados são adequados para estudos em engenharia de materiais e dispositivos semicondutores, contribuindo para a compreensão dos mecanismos de formação de silicetos, otimização de processos térmicos e desenvolvimento de contatos metálicos avançados para tecnologias CMOS. (2026-04-10)
Subject Engineering; Physics
Keyword Microtechnology, Silicon, Nickel-platinum alloys, Metallization, Heat treatment, Materials
Related Publication HUMMEL CIOLDIN, Frederico. Formação e caracterização de filmes finos de NiPtSi sobre Si: efeitos de parâmetros de processamento e tratamento térmico. Dissertação (Mestrado em Engenharia Elétrica) – Universidade Estadual de Campinas, Campinas, 2026.
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19 Variables, 51 Observations UNF:6:CRn3/Ayb3Zh+AaI9ANrBzw==
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